2~6 inisi 4° ese-matamata P-ituaiga 4H-SiC substrate

Fa'amatalaga Puupuu:

4° off-angle P-ituaiga 4H-SiC substrate‌ o se mea semiconductor faapitoa, lea o le "4° off-angle" e faasino i le tioata faʻataʻitaʻiga tulimanu o le wafer e 4 tikeri ese-matamata, ma le "P-ituaiga" e faasino i. le ituaiga conductivity o le semiconductor. O lenei mea o loʻo i ai faʻaoga taua i totonu o le semiconductor alamanuia, aemaise lava i fanua o eletise eletise ma eletise eletise maualuga.


Fa'amatalaga Oloa

Faailoga o oloa

Semicera's 2 ~ 6 inisi 4 ° off-angle P-ituaiga 4H-SiC substrates ua faʻainisinia e faʻafetaui le faʻatupulaia o manaʻoga o le mana maualuga ma le gaosiga o masini RF. O le 4° i fafo-angle orientation faʻamautinoaina le faʻatupulaia o le epitaxial, ma avea ai lenei mea ma faʻavae lelei mo le tele o masini semiconductor, e aofia ai MOSFET, IGBT, ma diodes.

O lenei 2 ~ 6 inisi 4 ° off-angle P-ituaiga 4H-SiC substrate o loʻo i ai mea faʻapitoa sili ona lelei, e aofia ai le maualuga o le vevela, faʻaogaina eletise lelei, ma le faʻamautuina o masini. Ole fa'ata'ita'iga i fafo e fesoasoani e fa'aitiitia ai le tele o le micropipe ma fa'aolaina ai le epitaxial layers, lea e taua tele i le fa'aleleia atili o le fa'atinoga ma le fa'amaoni ole masini semiconductor mulimuli.

Semicera's 2 ~ 6 inisi 4 ° off-angle P-ituaiga 4H-SiC substrates o loʻo maua i le tele o diameters, e amata mai i le 2 inisi i le 6 inisi, e fetaui ma manaoga eseese o gaosiga. O a matou mea'ai e fa'ainisinia tonu e tu'uina atu ai tulaga tutusa o le doping ma uiga maualuga maualuga, fa'amautinoa o lo'o fa'amalieina ta'itasi ta'ito'atasi ma fa'amatalaga sa'o mana'omia mo fa'aoga fa'aeletoroni fa'aeletonika.

O le tautinoga a Semicera i le faʻafouina ma le lelei e faʻamautinoa ai o la matou 2 ~ 6 inisi 4 ° off-angle P-type 4H-SiC substrates e tuʻuina atu faʻatinoga faifaipea i le tele o talosaga mai le eletise eletise i masini maualuga. O lenei oloa e maua ai se fofo faʻatuatuaina mo le isi augatupulaga o le malosi-lelei, maualuga-faʻatinoina semiconductors, lagolagoina le alualu i luma faatekinolosi i alamanuia e pei o taavale afi, fesoʻotaʻiga, ma le malosi faʻafouina.

Tulaga fa'atatau i le tele

Tele

2-Inisi

4-Inisi

Diamita 50.8 mm±0.38 mm 100.0 mm+0/-0.5 mm
Fa'ata'ita'iga i luga 4° agai i<11-20>±0.5° 4° agai i<11-20>±0.5°
Primary Flat Umi 16.0 mm±1.5mm 32.5mm±2mm
Lua Mafolafola Umi 8.0 mm±1.5mm 18.0 mm ± 2 mm
Primary Flat Orientation Fa'atusa <11-20>±5.0° Fa'atasi<11-20>±5.0c
Tulaga Lua mafolafola 90°CW mai le tulaga muamua ± 5.0°, fa'asaga i luga le silikoni 90°CW mai le tulaga muamua ± 5.0°, fa'asaga i luga le silikoni
Fa'ai'uga C-Face: Optical Polish, Si-Face: CMP C-Face: OpticalPolish, Si-Face: CMP
Wafer Edge Fa'ata'oto Fa'ata'oto
Fa'asaa o luga Si-Face Ra<0.2 nm Si-Face Ra<0.2nm
mafiafia 350.0±25.0um 350.0±25.0um
Polytype 4H 4H
Doping p-ituaiga p-ituaiga

Tulaga fa'atatau i le tele

Tele

6-Inisi
Diamita 150.0 mm+0/-0.2 mm
Fa'asagaga i luga 4° agai i<11-20>±0.5°
Primary Flat Umi 47.5mm ± 1.5mm
Lua Mafolafola Umi Leai
Primary Flat Orientation Fa'atasi ma <11-20>±5.0°
SecondaryFlat Orientation 90°CW mai le tulaga muamua ± 5.0°, fa'asaga i luga le silikoni
Fa'ai'uga C-Face: Polokalama Optical, Si-Face:CMP
Wafer Edge Fa'ata'oto
Fa'asaa o luga Si-Face Ra<0.2 nm
mafiafia 350.0±25.0μm
Polytype 4H
Doping p-ituaiga

Ramana

2-6 inisi 4° ese-matamata P-ituaiga 4H-SiC substrate-3

Pi'oga lulu

2-6 inisi 4° ese-matamata P-ituaiga 4H-SiC substrate-4

Ta'ese le tele

2-6 inisi 4° ese-matamata P-ituaiga 4H-SiC substrate-5

ata togitogi KOH

2-6 inisi 4° ese-matamata P-ituaiga 4H-SiC substrate-6
SiC wafers

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