4″ 6″ 8″ Fa'aoso & Semi-Insulating Substrates

Fa'amatalaga Puupuu:

Semicera ua tuuto atu i le tuʻuina atu o substrates semiconductor maualuga, o mea taua ia mo le gaosiga o masini semiconductor. Ua vaevaeina a tatou substrates i ituaiga conductive ma semi-insulating e fetaui ma manaoga o talosaga eseese. E ala i le malamalama loloto i mea tau eletise o substrates, Semicera fesoasoani ia te oe e filifili mea e sili ona talafeagai e faʻamautinoa ai le lelei o le faʻatinoga i le gaosiga o masini. Filifili Semicera, filifili uiga sili ona lelei e faʻamalosia ai le faʻamaoni ma le faʻafouina.


Fa'amatalaga Oloa

Faailoga o oloa

Silicon carbide (SiC) mea tioata tasi o loʻo i ai le lautele o le va tele (~ Si 3 taimi), conductivity vevela maualuga (~ Si 3.3 taimi po o GaAs 10 taimi), maualuga electron saturation fua faatatau (~ Si 2.5 taimi), eletise malepe maualuga. fanua (~ Si 10 taimi po o GaAs 5 taimi) ma isi uiga mataʻina.

O le vaega lona tolu o mea semiconductor e masani ona aofia ai SiC, GaN, taimane, ma isi, aua o lona lautele gap lautele (Eg) e sili atu pe tutusa ma le 2.3 electron volts (eV), e lauiloa foi o mea lautele gap semiconductor mea. Pe a faatusatusa i mea semiconductor augatupulaga muamua ma lona lua, o le lona tolu o augatupulaga semiconductor mea e maua ai le tulaga lelei o le conductivity vevela maualuga, fanua malepe eletise maualuga, maualuga saturated electron fua faatatau femalagaiga ma le malosi fusia maualuga, lea e mafai ona ausia manaoga fou o tekinolosi faaonaponei mo le maualuga. vevela, malosi maualuga, maualuga maualuga, maualuga taimi ma faʻavevela tetee ma isi tulaga faigata. O loʻo i ai faʻamoemoega faʻaoga taua i vaega o le puipuiga a le atunuʻu, vaʻalele, aerospace, suʻesuʻega suauʻu, teuina o mata, ma isi, ma e mafai ona faʻaitiitia le malosi o le malosi e sili atu i le 50% i le tele o pisinisi faʻapitoa e pei o fesoʻotaʻiga lautele, malosi o le la, gaosiga o taavale, moli semiconductor, ma smart grid, ma e mafai ona faaitiitia le tele o meafaigaluega e sili atu i le 75%, lea e taua tele mo le atinaeina o le faasaienisi ma tekinolosi tagata.

Semicera malosi e mafai ona tuʻuina atu i tagata faʻatau le tulaga maualuga Conductive (Conductive), Semi-insulating (Semi-insulating), HPSI (High Purity semi-insulating) silicon carbide substrate; E le gata i lea, e mafai ona matou tuʻuina atu i tagata faʻatau i le tutusa ma le heterogeneous silicon carbide epitaxial sheets; E mafai foi ona matou faʻavasegaina le pepa epitaxial e tusa ai ma manaʻoga faʻapitoa o tagata faʻatau, ma e leai se faʻatonuga maualalo.

FAAMATALAGA WAFERING

*n-Pm=n-ituaiga Pm-Vaega,n-Ps=n-ituaiga Ps-Vaega,Sl=Semi-lnsulating

Aitema

8-Inisi

6-Inisi

4-Inisi
nP n-Pm n-Sa SI SI
TTV(GBIR) ≤6um ≤6um
Aufana(GF3YFCD)-Taua atoatoa ≤15μm ≤15μm ≤25μm ≤15μm
A'ai(GF3YFER) ≤25μm ≤25μm ≤40μm ≤25μm
LTV(SBIR)-10mmx10mm <2μm
Wafer Edge Fa'ata'oto

FA'ATA'U LUGA

*n-Pm=n-ituaiga Pm-Vaega,n-Ps=n-ituaiga Ps-Vaega,Sl=Semi-Insulating

Aitema

8-Inisi

6-Inisi

4-Inisi

nP n-Pm n-Sa SI SI
Fa'ai'uga Itulua Optical Polish, Si- Face CMP
Lau'ele'ele (10um x 10um) Si-FaceRa≤0.2nm
C-Face Ra≤ 0.5nm
(5umx5um) Si-Face Ra≤0.2nm
C-Face Ra≤0.5nm
Tipi Chips Leai se Fa'ataga (umi ma le lautele≥0.5mm)
Indents Leai se Fa'ataga
Manu'ese(Si-Fua'i) Qty.≤5, Fa'aopoopo
Length≤0.5×wafer diameter
Qty.≤5, Fa'aopoopo
Length≤0.5×wafer diameter
Qty.≤5, Fa'aopoopo
Length≤0.5×wafer diameter
Ta'eta'ei Leai se Fa'ataga
Tuusaunoaga Tupito 3mm
第2页-2
第2页-1
SiC wafers

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