Silicon carbide (SiC) mea tioata tasi o loʻo i ai le lautele o le va tele (~ Si 3 taimi), conductivity vevela maualuga (~ Si 3.3 taimi po o GaAs 10 taimi), maualuga electron saturation fua faatatau (~ Si 2.5 taimi), eletise malepe maualuga. fanua (~ Si 10 taimi po o GaAs 5 taimi) ma isi uiga mataʻina.
O le vaega lona tolu o mea semiconductor e masani ona aofia ai SiC, GaN, taimane, ma isi, aua o lona lautele gap lautele (Eg) e sili atu pe tutusa ma le 2.3 electron volts (eV), e lauiloa foi o mea lautele gap semiconductor mea. Pe a faatusatusa i mea semiconductor augatupulaga muamua ma lona lua, o le lona tolu o augatupulaga semiconductor mea e maua ai le tulaga lelei o le conductivity vevela maualuga, fanua malepe eletise maualuga, maualuga saturated electron fua faatatau femalagaiga ma le malosi fusia maualuga, lea e mafai ona ausia manaoga fou o tekinolosi faaonaponei mo le maualuga. vevela, malosi maualuga, maualuga maualuga, maualuga taimi ma faʻavevela tetee ma isi tulaga faigata. O loʻo i ai faʻamoemoega faʻaoga taua i vaega o le puipuiga a le atunuʻu, vaʻalele, aerospace, suʻesuʻega suauʻu, teuina o mata, ma isi, ma e mafai ona faʻaitiitia le malosi o le malosi e sili atu i le 50% i le tele o pisinisi faʻapitoa e pei o fesoʻotaʻiga lautele, malosi o le la, gaosiga o taavale, moli semiconductor, ma smart grid, ma e mafai ona faaitiitia le tele o meafaigaluega e sili atu i le 75%, lea e taua tele mo le atinaeina o le faasaienisi ma tekinolosi tagata.
Semicera malosi e mafai ona tuʻuina atu i tagata faʻatau le tulaga maualuga Conductive (Conductive), Semi-insulating (Semi-insulating), HPSI (High Purity semi-insulating) silicon carbide substrate; E le gata i lea, e mafai ona matou tuʻuina atu i tagata faʻatau i le tutusa ma le heterogeneous silicon carbide epitaxial sheets; E mafai foi ona matou faʻavasegaina le pepa epitaxial e tusa ai ma manaʻoga faʻapitoa o tagata faʻatau, ma e leai se faʻatonuga maualalo.
FA'AMATALAGA O O'OGA FA'AVAE
Tele | 6-inisi |
Diamita | 150.0mm+0mm/-0.2mm |
Fa'asagaga i luga | ese-axis:4° agai i<1120>±0.5° |
Primary Flat Umi | 47.5mm1.5mm |
Primary Flat Orientation | <1120>±1.0° |
Lua Flat | Leai |
mafiafia | 350.0um±25.0um |
Polytype | 4H |
Ituaiga Conductive | n-ituaiga |
FA'AMATALAGA FA'AMATALAGA
6-inisi | ||
Aitema | Vasega P-MOS | P-SBD Vasega |
Tete'e | 0.015Ω·cm-0.025Ω·cm | |
Polytype | Leai se faatagaina | |
Micropipe Density | ≤0.2/cm2 | ≤0.5/cm2 |
EPD | ≤4000/cm2 | ≤8000/cm2 |
TED | ≤3000/cm2 | ≤6000/cm2 |
BPD | ≤1000/cm2 | ≤2000/cm2 |
TSD | ≤300/cm2 | ≤1000/cm2 |
SF(fuaina e le UV-PL-355nm) | ≤0.5% vaega | ≤1% vaega |
Papatusi Hex ile malamalama maualuga | Leai se faatagaina | |
Vaaiga CarbonInclusions e le malamalama maualuga | Vaega fa'aopoopo≤0.05% |