6 Inisi n-ituaiga sic mea'ai

Fa'amatalaga Puupuu:

6-inisi n-type SiC substrate‌ o se mea semiconductor o loʻo faʻaalia i le faʻaaogaina o le 6-inisi le tele o le wafer, lea e faʻateleina ai le numera o masini e mafai ona gaosia i luga o se tasi wafer i luga o se vaega tele, ma faʻaitiitia ai le tau o masini. . O le atinaʻeina ma le faʻaogaina o le 6-inch n-type SiC substrates na faʻamanuiaina mai le alualu i luma o tekinolosi e pei o le auala o le tuputupu aʻe o le RAF, lea e faʻaitiitia ai faʻalavelave e ala i le tipiina o tioata i luga o faʻalavelave ma faʻataʻitaʻiga tutusa ma tioata toe faʻaleleia, ma faʻaleleia atili ai le lelei o le substrate. O le faʻaogaina o lenei substrate e taua tele i le faʻaleleia o le gaosiga lelei ma faʻaitiitia le tau o masini eletise SiC.

 


Fa'amatalaga Oloa

Faailoga o oloa

Silicon carbide (SiC) mea tioata tasi o loʻo i ai le lautele o le va tele (~ Si 3 taimi), conductivity vevela maualuga (~ Si 3.3 taimi po o GaAs 10 taimi), maualuga electron saturation fua faatatau (~ Si 2.5 taimi), eletise malepe maualuga. fanua (~ Si 10 taimi po o GaAs 5 taimi) ma isi uiga mataʻina.

O le vaega lona tolu o mea semiconductor e masani ona aofia ai SiC, GaN, taimane, ma isi, aua o lona lautele gap lautele (Eg) e sili atu pe tutusa ma le 2.3 electron volts (eV), e lauiloa foi o mea lautele gap semiconductor mea. Pe a faatusatusa i mea semiconductor augatupulaga muamua ma lona lua, o le lona tolu o augatupulaga semiconductor mea e maua ai le tulaga lelei o le conductivity vevela maualuga, fanua malepe eletise maualuga, maualuga saturated electron fua faatatau femalagaiga ma le malosi fusia maualuga, lea e mafai ona ausia manaoga fou o tekinolosi faaonaponei mo le maualuga. vevela, malosi maualuga, maualuga maualuga, maualuga taimi ma faʻavevela tetee ma isi tulaga faigata. O loʻo i ai faʻamoemoega faʻaoga taua i vaega o le puipuiga a le atunuʻu, vaʻalele, aerospace, suʻesuʻega suauʻu, teuina o mata, ma isi, ma e mafai ona faʻaitiitia le malosi o le malosi e sili atu i le 50% i le tele o pisinisi faʻapitoa e pei o fesoʻotaʻiga lautele, malosi o le la, gaosiga o taavale, moli semiconductor, ma smart grid, ma e mafai ona faaitiitia le tele o meafaigaluega e sili atu i le 75%, lea e taua tele mo le atinaeina o le faasaienisi ma tekinolosi tagata.

Semicera malosi e mafai ona tuʻuina atu i tagata faʻatau le tulaga maualuga Conductive (Conductive), Semi-insulating (Semi-insulating), HPSI (High Purity semi-insulating) silicon carbide substrate; E le gata i lea, e mafai ona matou tuʻuina atu i tagata faʻatau i le tutusa ma le heterogeneous silicon carbide epitaxial sheets; E mafai foi ona matou faʻavasegaina le pepa epitaxial e tusa ai ma manaʻoga faʻapitoa o tagata faʻatau, ma e leai se faʻatonuga maualalo.

FA'AMATALAGA O O'OGA FA'AVAE

Tele

 6-inisi
Diamita 150.0mm+0mm/-0.2mm
Fa'asagaga i luga ese-axis:4° agai i<1120>±0.5°
Primary Flat Umi 47.5mm1.5mm
Primary Flat Orientation <1120>±1.0°
Lua Flat Leai
mafiafia 350.0um±25.0um
Polytype 4H
Ituaiga Conductive n-ituaiga

FA'AMATALAGA FA'AMATALAGA

6-inisi
Aitema Vasega P-MOS P-SBD Vasega
Tete'e 0.015Ω·cm-0.025Ω·cm
Polytype Leai se faatagaina
Micropipe Density ≤0.2/cm2 ≤0.5/cm2
EPD ≤4000/cm2 ≤8000/cm2
TED ≤3000/cm2 ≤6000/cm2
BPD ≤1000/cm2 ≤2000/cm2
TSD ≤300/cm2 ≤1000/cm2
SF(fuaina e le UV-PL-355nm) ≤0.5% vaega ≤1% vaega
Papatusi Hex ile malamalama maualuga Leai se faatagaina
Vaaiga CarbonInclusions e le malamalama maualuga Vaega fa'aopoopo≤0.05%
信截图_20240822105943

Tete'e

Polytype

6 lnch n-ituaiga sic mea'ai (3)
6 lnch n-ituaiga sic mea'ai (4)

BPD&TSD

6 lnch n-ituaiga sic mea'ai (5)
SiC wafers

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