Fa'ailoga ICP Semiconductor Fa'apitoa (Etching)

Fa'amatalaga Puupuu:

Semicera Energy Technology Co., Ltd. ose ta'ita'i fa'atau oloa fa'apitoa i mea fa'atau ma semiconductor fa'atau.Matou te tuuto atu i le tuʻuina atu o oloa maualuga, faʻatuatuaina, ma fou i le gaosiga o semiconductor,alamanuia photovoltaicma isi matā'upu fa'atatau.

O la matou laina oloa e aofia ai SiC / TaC faʻapipiʻiina oloa graphite ma oloa sima, e aofia ai mea eseese e pei o le silicon carbide, silicon nitride, ma le alumini oxide ma isi.

I le avea ai o se tagata faʻalagolago, matou te malamalama i le taua o mea faʻaaogaina i le gaosiga o gaosiga, ma matou te tuuto atu i le tuʻuina atu o oloa e fetaui ma tulaga sili ona lelei e faʻamalieina ai manaʻoga o matou tagata faʻatau.

 

Fa'amatalaga Oloa

Faailoga o oloa

Fa'amatalaga o oloa

O la matou kamupani e tuʻuina atu auaunaga faʻapipiʻi SiC e ala i le auala CVD i luga o le graphite, ceramics ma isi mea, ina ia mafai ai e kasa faʻapitoa o loʻo i ai carbon ma silicon ona tali atu i le maualuga o le vevela e maua ai le mama maualuga SiC mole, molelaʻau teuina i luga o mea faʻapipiʻi, fa'atūina le SIC fa'apipi'i puipui.

Vaega autu:

1. maualuga le vevela oxidation tetee:

o loʻo lelei tele le faʻamaʻiina o le faʻamaʻi pe a maualuga le vevela ile 1600 C.

2. maualuga le mama: faia e vailaau ausa tuu i lalo o le maualuga vevela tulaga chlorination.

3. Erosion tete'e: maualuga ma'a'a, fa'apipi'i luga, vaega laiti.

4. Tete'e a'a: acid, alkali, masima ma organic reagents.

3

Fa'amatalaga autu o le CVD-SIC Coating

SiC-CVD Meatotino

Fauga tioata

FCC β vaega

Malosi

g/cm ³

3.21

Malosi

Vickers maaa

2500

Tele o Saito

μm

2~10

Vailaau Mama

%

99.99995

Malosiaga vevela

J·kg-1 ·K-1

640

Sulimation Temperature

2700

Malosi Felexural

MPa (RT 4-point)

415

Young's Modulus

Gpa (4pt pi'o, 1300℃)

430

Fa'alauteleina o le vevela (CTE)

10-6K-1

4.5

Fa'avevela vevela

(W/mK)

300


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