Folasaga ile Silicon Carbide Coating
O la matou vailaʻau Vapor Deposition (CVD) Silicon Carbide (SiC) faʻapipiʻi o se mea e sili ona umi ma faʻafefeteina, lelei mo siosiomaga e manaʻomia ai le maualuga o le pala ma le vevela.Silicon Carbide ufiufio lo'o fa'aogaina i ni mea manifinifi i luga o substrates eseese e ala i le fa'agasologa o le CVD, e ofoina atu uiga fa'atinoga sili atu.
Vaega Autu
● -Mama Silisili Ese: Fa'amaualuga i se fatuga sili ona mama o99.99995%, matouSiC fa'apipi'ifa'aiti'itia lamatiaga fa'aleagaina i fa'agaioiga semiconductor ma'ale'ale.
● -Superior Resistance: Fa'aalia lelei le tete'e atu i le ofuina ma le pala, ma fa'ato'a atoatoa mo fa'afitauli tau vaila'au ma plasma.
● -Ole maualuga o le vevela: Fa'amautinoa le fa'atuatuaina o le fa'atinoga i lalo o le vevela tele ona o lona uiga mata'ina o le vevela.
● -Dimensional Stable: Fa'atumauina le fa'amaoni o le fa'atulagaina i le tele o le vevela, fa'afetai i lona fa'alauteleina o le fa'amama.
● -Faʻaleleia le Maaa: Faatasi ai ma se fua faatatau o le maaa o40 GPa, o le matou SiC faʻapipiʻi e tetee atu i aʻafiaga taua ma abrasion.
● -Fa'amae'a Lau'ele'ele: Tuuina atu se fa'auma fa'aata, fa'aitiitia le fa'atupuina o vaega ma fa'aleleia le fa'atinoina o galuega.
Talosaga
Semicera SiC coatingse faʻaaogaina i laʻasaga eseese o le gaosiga o semiconductor, e aofia ai:
● -Fausia Chip LED
● -Polysilicon Gaosiga
● -Semiconductor Crystal Growth
● -Silicon ma SiC Epitaxy
● -Oxidation Thermal and Diffusion (TO&D)
Matou te tuʻuina atu vaega faʻapipiʻi SiC na gaosia mai le malosi maualuga o le isostatic graphite, carbon fiber-reinforced carbon ma le 4N recrystallized silicon carbide, faʻatulagaina mo faʻamaʻi vai-moe,STC-TCS converters, CZ unit reflectors, SiC wafer boat, SiCwafer foe, SiC wafer tube, ma wafer carriers fa'aaogaina i le PECVD, silicon epitaxy, MOCVD process.
Faamanuiaga
● -Fa'ateleina le Ola: Faʻaitiitia le faʻaitiitia o mea faigaluega ma tau faʻaleleia, faʻaleleia atili le lelei o le gaosiga.
● -Faʻaleleia Tulaga Lelei: Ausia luga o le mama maualuga e manaʻomia mo le faʻaogaina o le semiconductor, ma faʻamalosia ai le lelei o oloa.
● -Faʻateleina le Lelei: Fa'ateteleina faiga fa'avevela ma le CVD, fa'atupu ai le pupuu o taimi ta'amilosaga ma fua maualuga.
Fa'amatalaga Fa'apitoa
● - Fausia: FCC β vaega polycrystaline, e masani lava (111) fa'atatau
● -Tomia: 3.21 g/cm³
● -Maaa: 2500 Vickes malo (500g uta)
● -Maloaga gau: 3.0 MPa·m1/2
● -Fa'alili Fa'avela (100–600 °C): 4.3 x 10-6k-1
● -Elastic Modulus(1300 ℃):435 GPa
● -Typical Film Mafiafia:100 µm
● -Oona i luga:2-10 µm
Fa'amatalaga Mama (Su'eina ile Glow Discharge Mass Spectroscopy)
| Elemene | ppm | Elemene | ppm |
| Li | <0.001 | Cu | <0.01 |
| Be | <0.001 | Zn | <0.05 |
| Al | <0.04 | Ga | <0.01 |
| P | <0.01 | Ge | <0.05 |
| S | <0.04 | As | <0.005 |
| K | <0.05 | In | <0.01 |
| Ca | <0.05 | Sn | <0.01 |
| Ti | <0.005 | Sb | <0.01 |
| V | <0.001 | W | <0.05 |
| Cr | <0.05 | Te | <0.01 |
| Mn | <0.005 | Pb | <0.01 |
| Fe | <0.05 | Bi | <0.05 |
| Ni | <0.01 |
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