Si Alafua

Fa'amatalaga Puupuu:

Faatasi ai ma lona saʻo lelei ma maualuga le mama, Semicera's Si Substrate faʻamautinoa le faʻatuatuaina ma le faʻaauau le faʻatinoga i faʻaoga taua, e aofia ai le Epi-Wafer ma le Gallium Oxide (Ga2O3) gaosiga. Fuafuaina e lagolago ai le gaosiga o microelectronics maualuluga, o lenei substrate e ofoina atu tulaga faʻapitoa ma faʻamautu, avea ma mea taua mo tekinolosi faʻaonaponei i fesoʻotaʻiga, taʻavale, ma pisinisi.


Fa'amatalaga Oloa

Faailoga o oloa

O le Si Substrate e Semicera o se vaega taua i le gaosiga o masini semiconductor maualuga. Inisinia mai le maualuga-mama Silicon (Si), o lenei substrate e ofoina atu tulaga tulaga tutusa, mautu, ma le lelei conductivity, faia lelei mo le tele o talosaga alualu i luma i le semiconductor alamanuia. Pe fa'aaogaina i le Si Wafer, SiC Substrate, SOI Wafer, po'o le SiN Substrate gaosiga, o le Semicera Si Substrate e tu'uina atu tulaga lelei ma sili atu le fa'atinoga e fa'afetaui ai le fa'atupulaia o mana'oga o mea fa'atekonolosi fa'aonaponei ma mea fa'asaienisi.

Fa'atinoga le Mafaatusalia ma le Mamalu Maualuga ma le Sa'o

Semicera's Si Substrate o lo'o gaosia i le fa'aogaina o faiga fa'apitoa e fa'amautinoa ai le maualuga o le mama ma le fa'atonutonuina o fua. O le substrate o loʻo avea ma faʻavae mo le gaosiga o mea eseese e maualuga le faatinoga, e aofia ai Epi-Wafers ma AlN Wafers. O le saʻo ma le tutusa o le Si Substrate e avea ma filifiliga sili ona lelei mo le fatuina o laupepa epitaxial manifinifi ma isi vaega taua o loʻo faʻaaogaina i le gaosiga o isi augatupulaga semiconductors. Pe o e galue ma Gallium Oxide (Ga2O3) poʻo isi mea faʻapitoa, Semicera's Si Substrate faʻamautinoa le maualuga maualuga o le faʻatuatuaina ma le faʻatinoga.

Talosaga i Semiconductor Manufacturing

I totonu o le semiconductor industry, o le Si Substrate mai Semicera o loʻo faʻaaogaina i le tele o faʻaoga, e aofia ai le Si Wafer ma le SiC Substrate gaosiga, lea e maua ai se faʻamautu, faʻalagolago mo le faʻapipiʻiina o laupepa malosi. E taua tele le sao o le substrate i le fausiaina o SOI Wafers (Silicon On Insulator), lea e taua mo microelectronics alualu i luma ma fesoʻotaʻiga tuʻufaʻatasia. E le gata i lea, Epi-Wafers (epitaxial wafers) fausia i luga o Si Substrates e taua tele i le gaosia o masini semiconductor maualuga e pei o transistors eletise, diodes, ma fesoʻotaʻiga tuʻufaʻatasia.

E lagolagoina foi e le Si Substrate le gaosiga o masini e faʻaaoga ai le Gallium Oxide (Ga2O3), o se mea faʻalauiloa lautele-bandgap faʻaaogaina mo faʻaoga maualuga i le eletise eletise. E le gata i lea, o le fesoʻotaʻiga o Semicera's Si Substrate ma AlN Wafers ma isi mea faʻapitoa e faʻamautinoa ai e mafai ona ausia manaoga eseese o alamanuia faʻatekonolosi, ma avea ai ma fofo lelei mo le gaosiga o masini mataʻutia i fesoʻotaʻiga, taʻavale, ma pisinisi. .

Fa'atuatuaina ma Tulaga Tulaga Lelei mo Talosaga Fa'atekonolosi Maualuga

O le Si Substrate e Semicera ua fa'atonuina ma le fa'aeteete e fa'amalieina ai mana'oga faigata o le fa'aogaina o semiconductor. O lona tulaga fa'apitoa o le fa'atonuga ma le tulaga maualuga o mea i luga ole laiga ua avea ai ma mea lelei mo le fa'aogaina i kaseti mo felauaiga wafer, fa'apea fo'i ma le fa'atupuina o fa'ama'i sa'o maualuga i masini semiconductor. O le malosi o le substrate e fa'atumauina le tulaga lelei i lalo o tulaga fa'agasologa eseese e fa'amautinoa ai le la'ititi o fa'aletonu, fa'aleleia atili le fua ma le fa'atinoga o le oloa fa'ai'u.

Faatasi ai ma lona maualuga maualuga o le vevela, malosi faʻainisinia, ma le mama maualuga, Semicera's Si Substrate o le mea e filifilia mo tagata gaosi oloa o loʻo vaʻavaʻai e ausia tulaga maualuga o le saʻo, faʻamaoni, ma le faʻatinoga i le gaosiga o le semiconductor.

Filifili Semicera's Si Substrate mo Fofo Sili-Mama, Maualuluga

Mo tagata gaosi oloa i totonu o le semiconductor industry, o le Si Substrate mai Semicera e ofoina atu se fofo malosi, maualuga-lelei mo le tele o faʻaoga, mai le Si Wafer gaosiga i le fausiaina o Epi-Wafers ma SOI Wafers. Faatasi ai ma le le mafaatusalia mama, saʻo, ma le faʻamaoni, o lenei substrate e mafai ai le gaosiga o masini semiconductor tipi, faʻamautinoa le faʻatinoina o se taimi umi ma sili ona lelei. Filifili Semicera mo ou mana'oga Si substrate, ma fa'alagolago i se oloa ua fuafuaina e fa'afetaui ai mana'oga o tekonolosi a taeao.

Aitema

Gaosiga

Suesuega

Faafoliga

Fa'a tioata

Polytype

4H

Fa'asagaga i luga ole mea sese

<11-20 >4±0.15°

Fa'aeletise Parata

Fa'amamafa

n-ituaiga Nitrogen

Tete'e

0.015-0.025ohm·cm

Fa'ailoga Fa'ainisinia

Diamita

150.0±0.2mm

mafiafia

350±25 μm

Primary flat orientation

[1-100]±5°

Muamua mafolafola umi

47.5±1.5mm

Lua mafolafola

Leai

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

punou

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

A'ai

≤35 μm

≤45 μm

≤55 μm

Luma(Si-foliga) talatala(AFM)

Ra≤0.2nm (5μm*5μm)

Fauga

Micropipe density

<1 ae/cm2

<10 ea/cm2

<15 ea/cm2

Uamea eleelea

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tulaga Luma

Luma

Si

Fa'ai'uga luga

Si-foliga CMP

fasimea

≤60ea/wafer (tele≥0.3μm)

NA

Masisi

≤5ea/mm. Fa'aputuga umi ≤Diamita

Fa'aputuga umi≤2*Diamita

NA

Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina

Leai

NA

Ta'otoga meataalo/indents/ gau/papa hex

Leai

Polytype vaega

Leai

Vaega fa'aopoopo≤20%

Vaega fa'aopoopo≤30%

Faailoga leisa pito i luma

Leai

Tulaga Tulaga

Fa'ai'u tua

C-foliga CMP

Masisi

≤5ea/mm, Fa'aputuga umi≤2* Diamita

NA

faaletonu i tua

Leai

Talatala tua

Ra≤0.2nm (5μm*5μm)

Faailoga leisa tua

1 mm (mai le pito i luga)

pito

pito

Chamfer

afifiina

afifiina

Epi-sauni ma fa'apipi'i gaogao

afifiina kaseti tele-wafer

*Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD.

tech_1_2_size
SiC wafers

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