O le Silicon Film e Semicera o se mea e sili ona lelei, faʻainisinia saʻo ua mamanuina e faʻafetaui ai manaʻoga faʻapitoa o le semiconductor industry. O lo'o gaosia mai le silikoni mama, o lenei vaifofo manifinifi ata e ofoina atu le tutusa lelei, maualuga le mama, ma mea fa'apitoa tau eletise ma vevela. E lelei mo le faʻaaogaina i le tele o talosaga semiconductor, e aofia ai le gaosiga o Si Wafer, SiC Substrate, SOI Wafer, SiN Substrate, ma Epi-Wafer. Semicera's Silicon Film e fa'amautinoa le fa'atuatuaina ma le fa'aauau le fa'atinoga, ma avea ma mea taua mo microelectronics maualuluga.
Tulaga Sili ma Fa'atinoga mo le Fa'ameamea Semiconductor
Semicera's Silicon Film e lauiloa ona o lona malosi faʻainisinia mataʻina, maualuga le mautu o le vevela, ma le maualalo o faʻaletonu, o ia mea uma e taua tele i le fausiaina o semiconductor aoga maualuga. Pe faʻaaogaina i le gaosiga o masini Gallium Oxide (Ga2O3), AlN Wafer, poʻo Epi-Wafers, o le ata tifaga e maua ai se faavae malosi mo le faʻapipiʻiina o ata manifinifi ma le tuputupu aʻe o le epitaxial. O lona fetaui lelei ma isi semiconductor substrates pei o le SiC Substrate ma le SOI Wafers e fa'amautinoa ai le tu'ufa'atasia lelei i faiga o gaosiga o lo'o i ai nei, fesoasoani e fa'atumauina le maualuga o fua ma le tulaga lelei o oloa.
Talosaga i le Alamanuia Semiconductor
I totonu o pisinisi semiconductor, Semicera's Silicon Film e faʻaaogaina i le tele o talosaga, mai le gaosiga o Si Wafer ma SOI Wafer i faʻaoga faʻapitoa e pei o le SiN Substrate ma le Epi-Wafer creation. O le maualuga o le mama ma le saʻo o lenei ata tifaga e taua tele i le gaosiga o vaega faʻapitoa e faʻaaogaina i mea uma mai microprocessors ma fesoʻotaʻiga tuʻufaʻatasia i masini optoelectronic.
O le Silicon Film e iai sona sao taua i faiga semiconductor e pei o le tuputupu aʻe o le epitaxial, faʻapipiʻi wafer, ma le faʻapipiʻiina o ata manifinifi. O ana meatotino fa'atuatuaina e sili ona taua mo alamanuia e mana'omia ai si'osi'omaga sili ona pulea, e pei o potu mama i semiconductor fabs. E le gata i lea, o le Silicon Film e mafai ona tuʻufaʻatasia i masini kaseti mo le lelei o le taulimaina ma le felauaiga i le taimi o le gaosiga.
Fa'atuatuaina Fa'aumiumi ma Fa'amaoni
O se tasi o faʻamanuiaga autu o le faʻaaogaina o le Semicera's Silicon Film o lona faʻatuatuaina umi. Faatasi ai ma lona umi sili ona lelei ma le tumau lelei, o lenei ata tifaga e maua ai se fofo faʻalagolago mo siosiomaga gaosiga maualuga. Pe fa'aaogaina i masini semiconductor sa'o maualuga po'o fa'aoga fa'aeletoroni fa'aeletonika, Semicera's Silicon Film e fa'amautinoa e mafai e tagata gaosi oloa ona ausia le maualuga ma le fa'amaoni i le tele o oloa.
Aisea e Filifilia ai Semicera's Silicon Film?
O le Silicon Film mai Semicera o se mea taua mo faʻaoga pito i luga i le semiconductor alamanuia. O lona tulaga maualuga, e aofia ai le faʻamautuina lelei o le vevela, maualuga le mama, ma le malosi faʻainisinia, ia avea ma filifiliga sili mo tagata gaosi oloa o loʻo vaʻavaʻai e ausia tulaga maualuga i le gaosiga o le semiconductor. Mai le Si Wafer ma le SiC Substrate i le gaosiga o masini Gallium Oxide Ga2O3, o lenei ata tifaga e maua ai le lelei ma le faʻatinoga.
Faatasi ai ma le Semicera's Silicon Film, e mafai ona e faʻalagolago i se oloa e fetaui ma manaʻoga o le gaosiga o semiconductor faʻaonapo nei, e maua ai se faavae faʻalagolago mo le isi augatupulaga o mea tau eletise.
Aitema | Gaosiga | Suesuega | Faafoliga |
Fa'a tioata | |||
Polytype | 4H | ||
Fa'asagaga i luga ole mea sese | <11-20 >4±0.15° | ||
Fa'aeletise Parata | |||
Fa'amamafa | n-ituaiga Nitrogen | ||
Tete'e | 0.015-0.025ohm·cm | ||
Fa'ailoga Fa'ainisinia | |||
Diamita | 150.0±0.2mm | ||
mafiafia | 350±25 μm | ||
Primary flat orientation | [1-100]±5° | ||
Muamua mafolafola umi | 47.5±1.5mm | ||
Lua mafolafola | Leai | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
punou | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
A'ai | ≤35 μm | ≤45 μm | ≤55 μm |
Luma(Si-foliga) talatala(AFM) | Ra≤0.2nm (5μm*5μm) | ||
Fauga | |||
Micropipe density | <1 ae/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Uamea eleelea | ≤5E10atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
Tulaga Luma | |||
Luma | Si | ||
Fa'ai'uga luga | Si-foliga CMP | ||
fasimea | ≤60ea/wafer (tele≥0.3μm) | NA | |
Masisi | ≤5ea/mm. Fa'aputuga umi ≤Diamita | Fa'aputuga umi≤2*Diamita | NA |
Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina | Leai | NA | |
Ta'otoga meataalo/indents/ gau/papa hex | Leai | ||
Polytype vaega | Leai | Vaega fa'aopoopo≤20% | Vaega fa'aopoopo≤30% |
Faailoga leisa pito i luma | Leai | ||
Tulaga Tulaga | |||
Fa'ai'u tua | C-foliga CMP | ||
Masisi | ≤5ea/mm, Fa'aputuga umi≤2* Diamita | NA | |
faaletonu i tua | Leai | ||
Talatala tua | Ra≤0.2nm (5μm*5μm) | ||
Faailoga leisa tua | 1 mm (mai le pito i luga) | ||
pito | |||
pito | Chamfer | ||
afifiina | |||
afifiina | Epi-sauni ma fa'apipi'i gaogao afifiina kaseti tele-wafer | ||
*Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD. |