Silicon I luga ole Insulator Wafer

Fa'amatalaga Puupuu:

Semicera's Silicon On Insulator (SOI) Wafer e maua ai le tu'ueseeseina fa'aeletise fa'apitoa ma le fa'aogaina o le vevela mo fa'aoga maualuga. Fa'ainisinia e fa'ao'o mai ai le lelei ma le fa'atuatuaina o masini, o nei wafers o se filifiliga sili lea mo tekonolosi semiconductor. Filifili Semicera mo vaifofo ole SOI pito sili ona lata mai.


Fa'amatalaga Oloa

Faailoga o oloa

Semicera's Silicon On Insulator (SOI) Wafer o loʻo taʻimua i le faʻafouina o le semiconductor, ofoina atu le faʻaleleia o le eletise eletise ma le maualuga o le faʻaogaina o le vevela. O le fausaga o le SOI, o lo'o i ai se fa'amea manifinifi silikoni i luga o se mea fa'apipi'i, e maua ai fa'amanuiaga taua mo masini fa'aeletonika maualuga.

Ua mamanuina a matou wafers SOI e faʻaitiitia ai le malosi o le parasitic ma le leakage, lea e manaʻomia mo le atinaʻeina o fesoʻotaʻiga tuʻufaʻatasia maualuga ma maualalo. O lenei tekinolosi faʻaonaponei e faʻamautinoaina e sili atu le faʻaogaina o masini, faʻatasi ai ma le faʻaleleia atili o le saoasaoa ma faʻaitiitia le faʻaaogaina o le malosi, e taua tele mo mea faʻaonaponei faʻaeletoroni.

O fa'agaioiga fa'agasologa o gaosiga o lo'o fa'aaogaina e Semicera e fa'amautinoa ai le gaosiga o fa'ama'i so'o so'o fa'atasi ma le fa'alelei lelei. E taua tele lenei tulaga lelei mo faʻaoga i fesoʻotaʻiga, taʻavale, ma mea tau eletise, lea e manaʻomia ai vaega faʻalagolago ma maualuga.

I le faaopoopo atu i latou aoga eletise, Semicera's SOI wafers e ofoina atu le maualuga o le vevela, faʻaleleia le vevela ma le mautu i masini maualuga ma maualuga. O lenei vaega e sili ona taua i faʻaoga e aofia ai le tele o le vevela ma manaʻomia le pulea lelei o le vevela.

E ala i le filifilia o le Semicera's Silicon On Insulator Wafer, e te teu fa'afaigaluega i se oloa e lagolago ai le alualu i luma o tekinolosi fa'aonaponei. O la matou tautinoga i le lelei ma le faʻafouina e faʻamautinoa ai o matou SOI wafers e fetaui ma manaʻoga faigata o pisinisi semiconductor i aso nei, e maua ai le faʻavae mo masini eletise e sosoo ai.

Aitema

Gaosiga

Suesuega

Faafoliga

Parata tioata

Polytype

4H

Fa'asagaga i luga o mea sese

<11-20 >4±0.15°

Fa'aeletise Parata

Fa'amama

n-ituaiga Nitrogen

Tete'e

0.015-0.025ohm·cm

Fa'ailoga Fa'ainisinia

Diamita

150.0±0.2mm

mafiafia

350±25 μm

Primary flat orientation

[1-100]±5°

Muamua mafolafola umi

47.5±1.5mm

Lua mafolafola

Leai

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

punou

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

A'ai

≤35 μm

≤45 μm

≤55 μm

Luma(Si-foliga) talatala(AFM)

Ra≤0.2nm (5μm*5μm)

Fauga

Micropipe density

<1 ae/cm2

<10 ea/cm2

<15 ea/cm2

Uamea eleelea

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tulaga Luma

Luma

Si

Fa'ai'uga luga

Si-foliga CMP

fasimea

≤60ea/wafer (tele≥0.3μm)

NA

Masisi

≤5ea/mm. Fa'aputuga umi ≤Diamita

Fa'aputuga umi≤2*Diamita

NA

Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina

Leai

NA

Ta'otoga meataalo/indents/ gau/papa hex

Leai

Polytype vaega

Leai

Vaega fa'aopoopo≤20%

Vaega fa'aopoopo≤30%

Faailoga leisa pito i luma

Leai

Tulaga Tulaga

Fa'ai'u tua

C-foliga CMP

Masisi

≤5ea/mm, Fa'aputuga umi≤2* Diamita

NA

faaletonu i tua

Leai

Talatala tua

Ra≤0.2nm (5μm*5μm)

Faailoga leisa tua

1 mm (mai le pito i luga)

pito

pito

Chamfer

afifiina

afifiina

Epi-sauni ma fa'apipi'i gaogao

afifiina kaseti tele-wafer

*Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD.

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SiC wafers

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