SiN Ceramics Plain Substrates

Fa'amatalaga Puupuu:

Semicera's SiN Ceramics Plain Substrates e maua ai le fa'aogaina o le vevela ma le fa'ainisinia mo fa'aoga maualuga. Inisinia mo le sili atu le umi ma le faʻamaoni, o nei substrates e lelei mo masini faʻaeletoroni faʻaeletonika. Filifili Semicera mo fofo sili SiN sili ona lelei e fetaui ma ou manaʻoga.


Fa'amatalaga Oloa

Faailoga o oloa

Semicera's SiN Ceramics Plain Substrates e maua ai se fofo maualuga mo le tele o mea faʻaeletoroni ma fale gaosi oloa. E lauiloa mo le lelei tele o le vevela ma le malosi faʻainisinia, o nei mea e faʻamautinoa ai le faʻatuatuaina o le faʻaogaina i siosiomaga faigata.

O matou SiN (Silicon Nitride) ceramics ua mamanuina e taulimaina ai le vevela ogaoga ma tulaga maualuga-faʻalavelave, faʻapena ona talafeagai mo eletise eletise ma masini semiconductor maualuga. O lo latou tumau ma le tete'e atu i le fa'ate'ia o le vevela e lelei ai mo le fa'aoga i fa'aoga e taua tele ai le fa'atuatuaina ma le fa'atinoga.

Ole fa'agasologa ole gaosiga sa'o a Semicera e fa'amautinoaina ole fa'amalieina ole mea'ai ta'itasi ta'itasi tulaga fa'ata'atia lelei. O le mea lea e maua ai substrates e tutusa le mafiafia ma le tulaga lelei o luga, lea e taua mo le ausiaina o galuega sili ona lelei i faʻapotopotoga faʻaeletoroni ma faiga.

I le fa'aopoopoina i latou fa'alelei ma mea fa'ainisinia, SiN Ceramics Plain Substrates e ofoina atu mea lelei fa'amama eletise. Ole mea lea e fa'amautinoa ai le fa'alavelave tau eletise ma fesoasoani i le mautu atoa ma le lelei o vaega fa'aeletoroni, fa'aleleia atili ai le ola fa'atino.

E ala i le filifilia o Semicera's SiN Ceramics Plain Substrates, o lo'o e filifilia se oloa e tu'ufa'atasia fa'asaienisi meafaitino maualuluga ma le gaosiga maualuga. O la matou tautinoga i le tulaga lelei ma le faʻafouina e faʻamaonia ai e te mauaina mea e fetaui ma tulaga maualuga o alamanuia ma lagolagoina le manuia o au poloketi faʻatekonolosi.

Aitema

Gaosiga

Suesuega

Faafoliga

Parata tioata

Polytype

4H

Fa'asagaga i luga o mea sese

<11-20 >4±0.15°

Fa'aeletise Parata

Fa'amama

n-ituaiga Nitrogen

Tete'e

0.015-0.025ohm·cm

Fa'ailoga Fa'ainisinia

Diamita

150.0±0.2mm

mafiafia

350±25 μm

Primary flat orientation

[1-100]±5°

Muamua mafolafola umi

47.5±1.5mm

Lua mafolafola

Leai

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

punou

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

A'ai

≤35 μm

≤45 μm

≤55 μm

Luma(Si-foliga) talatala(AFM)

Ra≤0.2nm (5μm*5μm)

Fauga

Micropipe density

<1 ae/cm2

<10 ea/cm2

<15 ea/cm2

Uamea eleelea

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tulaga Luma

Luma

Si

Fa'ai'uga luga

Si-foliga CMP

fasimea

≤60ea/wafer (tele≥0.3μm)

NA

Masisi

≤5ea/mm. Fa'aputuga umi ≤Diamita

Fa'aputuga umi≤2*Diamita

NA

Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina

Leai

NA

Ta'otoga meataalo/indents/ gau/papa hex

Leai

Polytype vaega

Leai

Vaega fa'aopoopo≤20%

Vaega fa'aopoopo≤30%

Faailoga leisa pito i luma

Leai

Tulaga Tulaga

Fa'ai'u tua

C-foliga CMP

Masisi

≤5ea/mm, Fa'aputuga umi≤2* Diamita

NA

faaletonu i tua

Leai

Talatala tua

Ra≤0.2nm (5μm*5μm)

Faailoga leisa tua

1 mm (mai le pito i luga)

pito

pito

Chamfer

afifiina

afifiina

Epi-sauni ma fa'apipi'i gaogao

afifiina kaseti tele-wafer

*Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD.

tech_1_2_size
SiC wafers

  • Muamua:
  • Sosoo ai: