850V Malosi maualuga GaN-on-Si Epi Wafer

Fa'amatalaga Puupuu:

850V Malosi maualuga GaN-on-Si Epi Wafer– Su'esu'e le isi fa'atupulaga o tekonolosi semiconductor fa'atasi ai ma le Semicera's 850V High Power GaN-on-Si Epi Wafer, fa'atulagaina mo le fa'atinoga sili atu ma le lelei i fa'aoga maualuga-voltage.


Fa'amatalaga Oloa

Faailoga o oloa

Semicerafaailoa atu le850V Malosi maualuga GaN-on-Si Epi Wafer, o se fa'alavelave i le fa'afouga semiconductor. O lenei epi wafer maualuga e tuʻufaʻatasia le maualuga o le Gallium Nitride (GaN) faʻatasi ai ma le tau-lelei o Silicon (Si), fatuina se fofo mamana mo talosaga maualuga-voltage.

Vaega Autu:

Uunaiga Maualuluga Voltage: Faʻainisinia e lagolago e oʻo atu i le 850V, o lenei GaN-on-Si Epi Wafer e lelei mo le manaʻomia o le eletise eletise, faʻatagaina le maualuga ma le faʻatinoga.

Fa'ateleina Malosi'i: Faʻatasi ai ma le faʻaogaina o le eletise sili atu ma le faʻaogaina o le vevela, o le GaN tekinolosi e mafai ai ona faʻapipiʻi mamanu ma faʻateleina le malosi.

Fofo taugofie: E ala i le fa'aogaina o le silikoni e fai ma mea'ai, o lenei epi wafer e ofoina atu se tau-lelei fa'atauga i gaN wafers masani, e aunoa ma le fetuutuunai i le lelei po'o le fa'atinoga.

Lautele Fa'aaogāga: Atoatoa mo le faʻaaogaina i mea faʻaliliu eletise, RF amplifier, ma isi masini eletise eletise, faʻamautinoa le faʻamaoni ma le tumau.

Su'esu'e le lumana'i o tekonolosi maualuga ma Semicera's850V Malosi maualuga GaN-on-Si Epi Wafer. Fuafuaina mo faʻaoga faʻapitoa, o lenei oloa e faʻamautinoaina le faʻaogaina o au masini faʻaeletoroni ma le maualuga ma le faʻamaoni. Filifili Semicera mo lou isi augatupulaga e manaʻomia semiconductor.

Aitema

Gaosiga

Suesuega

Faafoliga

Fa'a tioata

Polytype

4H

Fa'asagaga i luga ole mea sese

<11-20 >4±0.15°

Fa'aeletise Parata

Fa'amamafa

n-ituaiga Nitrogen

Tete'e

0.015-0.025ohm·cm

Fa'ailoga Fa'ainisinia

Diamita

150.0±0.2mm

mafiafia

350±25 μm

Primary flat orientation

[1-100]±5°

Muamua mafolafola umi

47.5±1.5mm

Lua mafolafola

Leai

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

punou

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

A'ai

≤35 μm

≤45 μm

≤55 μm

Luma(Si-foliga) talatala(AFM)

Ra≤0.2nm (5μm*5μm)

Fauga

Micropipe density

<1 ae/cm2

<10 ea/cm2

<15 ea/cm2

Uamea eleelea

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tulaga Luma

Luma

Si

Fa'ai'uga luga

Si-foliga CMP

fasimea

≤60ea/wafer (tele≥0.3μm)

NA

Masisi

≤5ea/mm. Fa'aputuga umi ≤Diamita

Fa'aputuga umi≤2*Diamita

NA

Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina

Leai

NA

Ta'otoga meataalo/indents/ gau/papa hex

Leai

Polytype vaega

Leai

Vaega fa'aopoopo≤20%

Vaega fa'aopoopo≤30%

Faailoga leisa pito i luma

Leai

Tulaga Tulaga

Fa'ai'u tua

C-foliga CMP

Masisi

≤5ea/mm, Fa'aputuga umi≤2* Diamita

NA

faaletonu i tua

Leai

Talatala tua

Ra≤0.2nm (5μm*5μm)

Faailoga leisa tua

1 mm (mai le pito i luga)

pito

pito

Chamfer

afifiina

afifiina

Epi-sauni ma fa'apipi'i gaogao

afifiina kaseti tele-wafer

*Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD.

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SiC wafers

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