Semiconductor SiC ufiufi monocrystalline silicon epitaxial disk

Semiconductor SiC coated monocrystalline silicon epitaxial disk Ata Fa'aalia

Fa'amatalaga Puupuu:

Semicera Energy Technology Co., Ltd. ose ta'ita'i fa'atau oloa fa'apitoa i mea fa'atau ma semiconductor fa'atau.Matou te tuuto atu i le tuʻuina atu o oloa maualuga, faʻatuatuaina, ma fou i le gaosiga o semiconductor,alamanuia photovoltaicma isi matā'upu fa'atatau.

O la matou laina oloa e aofia ai SiC / TaC faʻapipiʻiina oloa graphite ma oloa sima, e aofia ai mea eseese e pei o le silicon carbide, silicon nitride, ma le alumini oxide ma isi.

I le avea ai o se tagata faʻalagolago, matou te malamalama i le taua o mea faʻaaogaina i le gaosiga o gaosiga, ma matou te tuuto atu i le tuʻuina atu o oloa e fetaui ma tulaga sili ona lelei e faʻamalieina ai manaʻoga o matou tagata faʻatau.

Auina imeli ia matou

Fa'amatalaga Oloa

Faailoga o oloa

Fa'amatalaga

E saunia e le matou kamupaniSiC fa'apipi'ifaiga auaunaga e ala CVD auala i luga o le graphite, ceramics ma isi mea, ina ia faʻapitoa kasa o loʻo i ai carbon ma silicon tali i le vevela maualuga e maua ai le mama maualuga mole SiC, molelaʻau teuina i luga o le pito i luga o mea ufiufi, faia.SIC puipui puipui.

Vaega Autu

1. maualuga le vevela oxidation tetee:
o loʻo lelei tele le faʻamaʻiina o le faʻamaʻi pe a maualuga le vevela ile 1600 C.
2. Mamaa maualuga: faia e vailaau ausa tuu i lalo o le maualuga vevela tulaga chlorination.
3. Erosion tete'e: maualuga ma'a'a, fa'apipi'i luga, vaega laiti.
4. Tete'e a'a: acid, alkali, masima ma organic reagents.

Fa'amatalaga autu o le CVD-SIC Coating

SiC-CVD Meatotino
Fauga tioata	FCC β vaega
Malosi	g/cm ³	3.21
Malosi	Vickers maaa	2500
Tele o Saito	μm	2~10
Vailaau Mama	%	99.99995
Malosiaga vevela	J·kg-1 ·K-1	640
Sulimation Temperature	℃	2700
Malosi Felexural	MPa (RT 4-point)	415
Young's Modulus	Gpa (4pt pi'o, 1300℃)	430
Fa'alauteleina o le vevela (CTE)	10-6K-1	4.5
Fa'avevela vevela	(W/mK)	300