Fa'amatalaga
Matou te faʻatumauina le faʻapalepale vavalalata pe a faʻaaogaina leSiC fa'apipi'i, fa'aaogaina machining maualuga-sa'o e fa'amautinoa ai se fa'ailoga susceptor toniga.Matou te gaosia fo'i mea e fa'atatau i mea tau eletise lelei mo le fa'aogaina i faiga fa'avevela.O vaega uma ua mae'a o lo'o sau fa'atasi ma se tusi fa'amaonia mama ma le fua fa'atatau.
E saunia e le matou kamupaniSiC fa'apipi'iauaunaga faagasologa e auala CVD i luga o le graphite, ceramics ma isi mea, ina ia kasa faapitoa o loo i ai carbon ma silicon tali atu i le vevela maualuga e maua ai mole mama maualuga SiC, molelaʻau teuina i luga o le mea o loʻo ufiufi, fausia SIC layer puipuiga.O le SIC ua fausia o loʻo faʻapipiʻiina mau i le faavae o le graphite, e tuʻuina atu ai le faʻavae o le graphite o mea faʻapitoa, ma faʻapipiʻi ai le pito i luga ole graphite, Porosity-free, maualuga le vevela, faʻamaʻi faʻamaʻi ma faʻamaʻi faʻamaʻi.
O le faagasologa o le CVD e maua ai le mama maualuga ma le mamafa tele oSiC fa'apipi'ie leai se porosity.O le a le mea e sili atu, ona o le silicon carbide e matua faigata lava, e mafai ona faʻaiila i luga o se faʻata-pei o luga.CVD silicon carbide (SiC) faʻapipiʻina tu'uina atu le tele o mea lelei e aofia ai le maualuga o le mama mama ma sili ona ofuina le umi.Talu ai o oloa faʻapipiʻiina o loʻo i ai le tele o faʻatinoga i le maualuga o le gaogao ma le maualuga o le vevela, e lelei mo faʻaoga ile semiconductor alamanuia ma isi siosiomaga ultra-mama.Matou te tuʻuina atu foʻi oloa pyrolytic graphite (PG).
Vaega Autu
1. maualuga le vevela oxidation tetee:
o loʻo lelei tele le faʻamaʻiina o le faʻamaʻi pe a maualuga le vevela ile 1600 C.
2. Mamaa maualuga: faia e vailaau ausa tuu i lalo o le maualuga vevela tulaga chlorination.
3. Erosion tete'e: maualuga ma'a'a, fa'apipi'i luga, vaega laiti.
4. Tete'e a'a: acid, alkali, masima ma organic reagents.
Fa'amatalaga autu o le CVD-SIC Coatings
| SiC-CVD | ||
| Malosi | (g/cc) | 3.21 |
| Malosi fa'apa'u | (Mpa) | 470 |
| Fa'alauteleina o le vevela | (10-6/K) | 4 |
| Fa'avevela vevela | (W/mK) | 300 |
Fa'atatauga
O le CVD silicon carbide coating ua uma ona faʻaaogaina i alamanuia semiconductor, e pei o le MOCVD tray, RTP ma le oxide etching chamber talu mai le silicon nitride e malosi le teteʻi vevela ma e mafai ona tatalia plasma malosi maualuga.
-Silicon carbide e masani ona faʻaaogaina i le semiconductor ma le ufiufi.
Fa'atatauga
Avanoa Avanoa:
10000 Piece/Pieces i le masina
afifiina ma Tiliva:
Fa'aputuina: Tulaga Fa'ata'atia & Malosi
Poly taga + Pusa + Pusa + Pusa
Taulaga:
Ningbo/Shenzhen/Shanghai
Taimi muamua:
| Aofa'i (Isi) | 1 – 1000 | >1000 |
| Est.Taimi(aso) | 15 | Ia feutagai |
