SiC Epitaxy

Fa'amatalaga Puupuu:

Semicera ofo atu ata manifinifi masani (silicon carbide)SiC epitaxy i substrates mo le atinaeina o masini carbide silicon. Weitai ua tuuto atu i le tuuina atu o oloa lelei ma tau faatauva, ma matou te tulimatai atu e avea ma au paaga umi i Saina.

 

Fa'amatalaga Oloa

Faailoga o oloa

SiC epitaxy (2)(1)

Fa'amatalaga o oloa

4h-n 4inch 6inch dia100mm sic fatu wafer 1mm mafiafia mo le tuputupu ae o ingot

Customzied lapopoa/2inch/3inch/4inch/6inch 6H-N/4H-SEMI/4H-N SIC ingots/Mama maualuga 4H-N 4inch 6inch dia 150mm silicon carbide tioata tasi (sic) substrates wafersS/ Customzied as-cut sic wafersProduction 4inch vasega 4H-N 1.5mm SIC Wafers mo fatu tioata

E uiga i le Silicon Carbide (SiC)Crystal

Silicon carbide (SiC), e lauiloa foi o le carborundum, o se semiconductor o loʻo i ai le silikoni ma le carbon faʻatasi ai ma le vailaʻau SiC. SiC o loʻo faʻaaogaina i masini eletise semiconductor o loʻo galue i le maualuga o le vevela poʻo le maualuga o voltage, poʻo uma. eletise eletise.

Fa'amatalaga

Meatotino

4H-SiC, Mata'u Tasi

6H-SiC, Mata'u Tasi

Lattice Parameter

a=3.076 Å c=10.053 Å

a=3.073 Å c=15.117 Å

Fa'aputuga Fa'asologa

ABCB

ABCACB

Mohs Malosi

≈9.2

≈9.2

Malosi

3.21 g/cm3

3.21 g/cm3

Therm. Fa'atelega Fa'atele

4-5×10-6/K

4-5×10-6/K

Fa'asinoga Fa'atusa @750nm

leai = 2.61
ne = 2.66

leai = 2.60
ne = 2.65

Dielectric tumau

c~9.66

c~9.66

Amioga vevela (ituaiga N, 0.02 ohm.cm)

a~4.2 W/cm·K@298K
c~3.7 W/cm·K@298K

 

Fa'avevela vevela (Semi-insulating)

a~4.9 W/cm·K@298K
c~3.9 W/cm·K@298K

a~4.6 W/cm·K@298K
c~3.2 W/cm·K@298K

Vaega-va

3.23 eV

3.02 eV

Malae-Ilalo Eletise Malae

3-5×106V/cm

3-5×106V/cm

Saturation Drift Velocity

2.0×105m/s

2.0×105m/s

SiC wafers

Semicera Nofoaga faigaluega Semicera fale faigaluega 2 Meafaigaluega masini CNN faʻagaioiga, vailaʻau faʻamamaina, faʻapipiʻi CVD O la matou tautua


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