Semicera'sSilicon Carbide Epitaxyua fa'ainisinia e fa'amalieina mana'oga faigata o fa'aoga semiconductor fa'aonaponei. E ala i le fa'aogaina o metotia fa'atupuina epitaxial, matou te fa'amautinoaina e fa'aalia e vaega ta'itasi carbide silikoni tulaga lelei, tutusa, ma le la'ititi o fa'aletonu. O nei uiga e taua tele mo le atinaʻeina o eletise eletise maualuga, lea e sili ona taua le lelei ma le puleaina o le vevela.
O leSilicon Carbide Epitaxyfa'agasologa i Semicera ua fa'asilisiliina e maua ai fa'alava epitaxial ma le mafiafia sa'o ma le fa'atonutonuina o le doping, fa'amautinoa le fa'atinoina o galuega i le tele o masini. O lenei tulaga o le saʻo e manaʻomia mo faʻaoga i taʻavale eletise, faʻafouina malosiaga faʻafouina, ma fesoʻotaʻiga maualuga, lea e taua tele ai le faʻatuatuaina ma le lelei.
E le gata i lea, o Semicera'sSilicon Carbide Epitaxyofo atu le fa'aleleia atili o le vevela ma le maualuga o le gau, ma avea ai ma filifiliga sili mo masini e fa'aogaina i lalo o tulaga ogaoga. O nei meatotino e saofagā i le umi o le ola o masini ma faʻaleleia atili le faʻaogaina o le faʻaogaina o le tino, aemaise i siosiomaga maualuga ma maualuga le vevela.
Semicera e tuʻuina atu foʻi filifiliga faʻapitoa moSilicon Carbide Epitaxy, fa'atagaina mo fofo fa'apitoa e fetaui ma mana'oga fa'apitoa mo masini. Pe mo suʻesuʻega poʻo le gaosiga tele, o matou epitaxial layers ua mamanuina e lagolago ai le isi augatupulaga o faʻafouga semiconductor, faʻatagaina le atinaʻeina o masini eletise sili atu le malosi, lelei, ma faʻatuatuaina.
E ala i le tu'ufa'atasia o tekonolosi fa'aonaponei ma faiga fa'atonutonu lelei, Semicera fa'amautinoa o tatouSilicon Carbide Epitaxyoloa e le gata ina ausia ae sili atu i tulaga tau alamanuia. O lenei tautinoga i le tulaga lelei ua avea ai a tatou epitaxial layers ma faavae lelei mo talosaga semiconductor maualuluga, saunia le ala mo le alualu i luma i le eletise eletise ma optoelectronics.
| Aitema | Gaosiga | Suesuega | Faafoliga |
| Parata tioata | |||
| Polytype | 4H | ||
| Fa'asagaga i luga o mea sese | <11-20 >4±0.15° | ||
| Fa'aeletise Parata | |||
| Fa'amama | n-ituaiga Nitrogen | ||
| Tete'e | 0.015-0.025ohm·cm | ||
| Fa'ailoga Fa'ainisinia | |||
| Diamita | 150.0±0.2mm | ||
| mafiafia | 350±25 μm | ||
| Primary flat orientation | [1-100]±5° | ||
| Muamua mafolafola umi | 47.5±1.5mm | ||
| Lua mafolafola | Leai | ||
| TTV | ≤5 μm | ≤10 μm | ≤15 μm |
| LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
| punou | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
| A'ai | ≤35 μm | ≤45 μm | ≤55 μm |
| Luma(Si-foliga) talatala(AFM) | Ra≤0.2nm (5μm*5μm) | ||
| Fauga | |||
| Micropipe density | <1 ae/cm2 | <10 ea/cm2 | <15 ea/cm2 |
| Uamea eleelea | ≤5E10atoms/cm2 | NA | |
| BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
| TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
| Tulaga Luma | |||
| Luma | Si | ||
| Fa'ai'uga luga | Si-foliga CMP | ||
| fasimea | ≤60ea/wafer (tele≥0.3μm) | NA | |
| Masisi | ≤5ea/mm. Fa'aputuga umi ≤Diamita | Fa'aputuga umi≤2*Diamita | NA |
| Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina | Leai | NA | |
| Ta'otoga meataalo/indents/ gau/papa hex | Leai | ||
| Polytype vaega | Leai | Vaega fa'aopoopo≤20% | Vaega fa'aopoopo≤30% |
| Faailoga leisa pito i luma | Leai | ||
| Tulaga Tulaga | |||
| Fa'ai'u tua | C-foliga CMP | ||
| Masisi | ≤5ea/mm, Fa'aputuga umi≤2* Diamita | NA | |
| faaletonu i tua | Leai | ||
| Talatala tua | Ra≤0.2nm (5μm*5μm) | ||
| Faailoga leisa tua | 1 mm (mai le pito i luga) | ||
| pito | |||
| pito | Chamfer | ||
| afifiina | |||
| afifiina | Epi-sauni ma fa'apipi'i gaogao afifiina kaseti tele-wafer | ||
| *Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD. | |||
