Silicon Carbide Epitaxy

Fa'amatalaga Puupuu:

Silicon Carbide Epitaxy– Laega epitaxial maualuga e fa'atulagaina mo fa'aoga semiconductor maualuluga, e ofoina atu le fa'atinoga sili atu ma le fa'amaoni mo le eletise eletise ma masini optoelectronic.


Fa'amatalaga Oloa

Faailoga o oloa

Semicera'sSilicon Carbide Epitaxyua fa'ainisinia e fa'amalieina mana'oga faigata o fa'aoga semiconductor fa'aonaponei. E ala i le fa'aogaina o metotia fa'atupuina epitaxial, matou te fa'amautinoaina e fa'aalia e vaega ta'itasi carbide silikoni tulaga lelei, tutusa, ma le la'ititi o fa'aletonu. O nei uiga e taua tele mo le atinaʻeina o eletise eletise maualuga, lea e sili ona taua le lelei ma le puleaina o le vevela.

O leSilicon Carbide Epitaxyfa'agasologa i Semicera ua fa'asilisiliina e maua ai fa'apalapala epitaxial ma le mafiafia sa'o ma le fa'atonutonuina o le doping, fa'amautinoa le fa'atinoina o galuega i le tele o masini. O lenei tulaga o le saʻo e manaʻomia mo faʻaoga i totonu o taavale eletise, faʻafouina malosiaga faʻafouina, ma fesoʻotaʻiga maualuga, lea e taua tele ai le faʻatuatuaina ma le lelei.

E le gata i lea, o Semicera'sSilicon Carbide Epitaxyofo atu le fa'aleleia atili o le vevela ma le maualuga o le gau, ma avea ai ma filifiliga sili mo masini e fa'aogaina i lalo o tulaga ogaoga. O nei meatotino e saofagā i le umi o le ola o masini ma faʻaleleia atili le faʻaogaina o le faʻaogaina o le tino, aemaise i siosiomaga maualuga ma maualuga le vevela.

Semicera e tuʻuina atu foʻi filifiliga faʻapitoa moSilicon Carbide Epitaxy, fa'atagaina mo fofo fa'apitoa e fetaui ma mana'oga fa'apitoa mo masini. Pe mo suʻesuʻega poʻo le gaosiga tele, o matou epitaxial layers ua mamanuina e lagolago ai le isi augatupulaga o faʻafouga semiconductor, faʻatagaina le atinaʻeina o masini eletise sili atu le malosi, lelei, ma faʻatuatuaina.

E ala i le tu'ufa'atasia o tekonolosi fa'aonaponei ma faiga fa'atonutonu lelei, Semicera fa'amautinoa o tatouSilicon Carbide Epitaxyoloa e le gata ina ausia ae sili atu i tulaga tau alamanuia. O lenei tautinoga i le tulaga lelei ua avea ai a tatou epitaxial layers ma faavae lelei mo talosaga semiconductor maualuluga, saunia le ala mo le alualu i luma i le eletise eletise ma optoelectronics.

Aitema

Gaosiga

Suesuega

Faafoliga

Fa'a tioata

Polytype

4H

Fa'asagaga i luga ole mea sese

<11-20 >4±0.15°

Fa'aeletise Parata

Fa'amamafa

n-ituaiga Nitrogen

Tete'e

0.015-0.025ohm·cm

Fa'ailoga Fa'ainisinia

Diamita

150.0±0.2mm

mafiafia

350±25 μm

Primary flat orientation

[1-100]±5°

Muamua mafolafola umi

47.5±1.5mm

Lua mafolafola

Leai

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

punou

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

A'ai

≤35 μm

≤45 μm

≤55 μm

Luma(Si-foliga) talatala(AFM)

Ra≤0.2nm (5μm*5μm)

Fauga

Micropipe density

<1 ae/cm2

<10 ea/cm2

<15 ea/cm2

Uamea eleelea

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tulaga Luma

Luma

Si

Fa'ai'uga luga

Si-foliga CMP

fasimea

≤60ea/wafer (tele≥0.3μm)

NA

Masisi

≤5ea/mm. Fa'aputuga umi ≤Diamita

Fa'aputuga umi≤2*Diamita

NA

Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina

Leai

NA

Ta'otoga meataalo/indents/ gau/papa hex

Leai

Polytype vaega

Leai

Vaega fa'aopoopo≤20%

Vaega fa'aopoopo≤30%

Faailoga leisa pito i luma

Leai

Tulaga Tulaga

Fa'ai'u tua

C-foliga CMP

Masisi

≤5ea/mm, Fa'aputuga umi≤2* Diamita

NA

faaletonu i tua

Leai

Talatala tua

Ra≤0.2nm (5μm*5μm)

Faailoga leisa tua

1 mm (mai le pito i luga)

pito

pito

Chamfer

afifiina

afifiina

Epi-sauni ma fa'apipi'i gaogao

afifiina kaseti tele-wafer

*Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD.

tech_1_2_size
SiC wafers

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