2″ Gallium Oxide Substrates

Fa'amatalaga Puupuu:

2″ Gallium Oxide Substrates– Fa'alelei au masini semiconductor i Semicera's maualuga 2″ Gallium Oxide Substrates, fa'ainisinia mo fa'atinoga sili atu ile eletise eletise ma fa'aoga UV.


Fa'amatalaga Oloa

Faailoga o oloa

Semiceraua fiafia e ofo atu2" Gallium Oxide Substrates, o se mea faʻapipiʻi ua fuafuaina e faʻaleleia ai le faʻatinoga o masini semiconductor maualuga. O nei mea'ai, faia mai le Gallium Oxide (Ga2O3), fa'aalia se va'a tele-lautele, ma avea ai i latou ma filifiliga lelei mo fa'aoga-maualuga, maualuga-televave, ma UV optoelectronic talosaga.

 

Vaega Autu:

• Ultra-Wide Bandgap: O le2" Gallium Oxide Substratestuʻuina atu se fusi faʻapitoa e tusa ma le 4.8 eV, faʻatagaina mo le maualuga o le voltage ma le vevela faʻaogaina, e sili atu nai lo le gafatia o mea masani semiconductor e pei o le silicon.

Malolo malepe tulaga ese: O mea nei e mafai ai e masini ona fa'atautaia le tele o voltage maualuga, ma fa'aatoatoaina mo eletise eletise, aemaise lava i fa'aoga maualuga-voltage.

Lelei Fa'avevela Fa'avevela: Faʻatasi ai ma le faʻamautu maualuga o le vevela, o nei mea faʻapipiʻi e faʻaauau pea le faʻatinoga e oʻo lava i siʻosiʻomaga vevela vevela, lelei mo faʻaoga maualuga ma maualuga le vevela.

Mea Maualuluga: O le2" Gallium Oxide Substratesofoina atu le maualalo densities faaletonu ma maualuga tioata, faʻamautinoaina le faʻatuatuaina ma le lelei faʻatinoga o au masini semiconductor.

Talosaga Fetuuna'i: O nei substrates e fetaui mo le tele o talosaga, e aofia ai transistors eletise, Schottky diodes, ma UV-C LED masini, ofoina atu se faavae malosi mo le mana ma optoelectronic innovations.

 

Tatala le gafatia atoatoa o au masini semiconductor ma Semicera's2" Gallium Oxide Substrates. O a matou mea'ai ua mamanuina e faʻafetaui ai manaʻoga manaʻomia o talosaga faʻapitoa i aso nei, faʻamautinoa le maualuga o le faʻatinoga, faʻamaoni, ma le lelei. Filifili Semicera mo mea fa'aonaponei fa'akomepiuta fa'aonaponei e fa'aosoina le fa'afouga.

Aitema

Gaosiga

Suesuega

Faafoliga

Parata tioata

Polytype

4H

Fa'asagaga i luga o mea sese

<11-20 >4±0.15°

Fa'aeletise Parata

Fa'amama

n-ituaiga Nitrogen

Tete'e

0.015-0.025ohm·cm

Fa'ailoga Fa'ainisinia

Diamita

150.0±0.2mm

mafiafia

350±25 μm

Primary flat orientation

[1-100]±5°

Muamua mafolafola umi

47.5±1.5mm

Lua mafolafola

Leai

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

punou

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

A'ai

≤35 μm

≤45 μm

≤55 μm

Luma(Si-foliga) talatala(AFM)

Ra≤0.2nm (5μm*5μm)

Fauga

Micropipe density

<1 ae/cm2

<10 ea/cm2

<15 ea/cm2

Uamea eleelea

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tulaga Luma

Luma

Si

Fa'ai'uga luga

Si-foliga CMP

fasimea

≤60ea/wafer (tele≥0.3μm)

NA

Masisi

≤5ea/mm. Fa'aputuga umi ≤Diamita

Fa'aputuga umi≤2*Diamita

NA

Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina

Leai

NA

Ta'otoga meataalo/indents/ gau/papa hex

Leai

Polytype vaega

Leai

Vaega fa'aopoopo≤20%

Vaega fa'aopoopo≤30%

Faailoga leisa pito i luma

Leai

Tulaga Tulaga

Fa'ai'u tua

C-foliga CMP

Masisi

≤5ea/mm, Fa'aputuga umi≤2* Diamita

NA

faaletonu i tua

Leai

Talatala tua

Ra≤0.2nm (5μm*5μm)

Faailoga leisa tua

1 mm (mai le pito i luga)

pito

pito

Chamfer

afifiina

afifiina

Epi-sauni ma fa'apipi'i gaogao

afifiina kaseti tele-wafer

*Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD.

tech_1_2_size
SiC wafers

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