Gallium Nitride Substrates|GaN Wafers

Fa'amatalaga Puupuu:

Gallium nitride (GaN), e pei o le silicon carbide (SiC), e aofia i le lona tolu o augatupulaga o mea semiconductor ma le lautele o le va o le lautele, faʻatasi ai ma le lautele o le vaʻa lautele, maualuga le vevela, maualuga le maualuga o le eletise, ma le maualuga o le eletise eletise mataʻina. uiga.GaN masini o loʻo i ai le tele o faʻamoemoega faʻaoga i le tele o taimi, saoasaoa maualuga ma le maualuga o le mana manaʻomia fanua e pei ole moli faʻasaoina o le malosi o le LED, faʻaaliga faʻaalia leisa, taʻavale malosi fou, laina atamai, fesoʻotaʻiga 5G.


Fa'amatalaga Oloa

Faailoga o oloa

GaN Wafers

O le vaega lona tolu o mea semiconductor e masani ona aofia ai SiC, GaN, taimane, ma isi, ona o lona lautele gap lautele (Eg) e sili atu pe tutusa ma le 2.3 electron volts (eV), e lauiloa foi o mea lautele gap semiconductor mea.Pe a faatusatusa i mea semiconductor augatupulaga muamua ma lona lua, o le lona tolu o augatupulaga semiconductor mea e maua ai le lelei o le conductivity vevela maualuga, fanua malepe eletise maualuga, maualuga saturated electron fua faatatau femalagaiga ma le malosi fusia maualuga, lea e mafai ona ausia manaoga fou o tekinolosi faaonaponei mo le maualuga. vevela, malosi maualuga, maualuga maualuga, maualuga taimi ma faʻavevela tetee ma isi tulaga faigata.O loʻo i ai faʻamoemoega faʻaoga taua i le fanua o le puipuiga a le atunuʻu, vaalele, aerospace, suʻesuʻega suauʻu, teuina faʻapitoa, ma isi, ma e mafai ona faʻaitiitia ai le malosi o le malosi e sili atu i le 50% i le tele o pisinisi faʻapitoa e pei o fesoʻotaʻiga lautele, malosi o le la, gaosiga o taavale, moli semiconductor, ma smart grid, ma e mafai ona faaitiitia le tele o meafaigaluega e sili atu i le 75%, lea e taua tele mo le atinaeina o le faasaienisi tagata ma tekinolosi.

 

Aitema 项目

GaN-FS-CU-C50

GaN-FS-CN-C50

GaN-FS-C-SI-C50

Diamita
晶圆直径

50.8 ± 1 mm

mafiafia厚度

350 ± 25 μm

Fa'atonuga
晶向

C vaalele (0001) ese le tulimanu agai i le M-axis 0.35 ± 0.15°

Palemia mafolafola
主定位边

(1-100) 0 ± 0.5°, 16 ± 1 mm

Lua Flat
次定位边

(11-20) 0 ± 3°, 8 ± 1 mm

Conductivity
导电性

N-ituaiga

N-ituaiga

Semi-Insulating

Tete'e (300K)
电阻率

<0.1 Ω·cm

<0.05 Ω·cm

> 106 Ω·cm

TTV
平整度

≤ 15 μm

FUA
弯曲度

≤ 20 μm

Ga Mata Fa'amata'u
Ga面粗糙度

<0.2 nm (faila);

po'o le <0.3 nm (fa'aiila ma togafitiga i luga ole epitaxy)

N Foliga Laugatasi
N面粗糙度

0.5 ~ 1.5 μm

filifiliga: 1 ~ 3 nm (eleele lelei);<0.2 nm (fa'aiila)

Dislocation Density
位错密度

Mai le 1 x 105 i le 3 x 106 cm-2 (fa'atatau ile CL)*

Mata'utia Fa'aletonu Matele
缺陷密度

<2 cm-2

Nofoaga Fa'aaogā
有效面积

> 90% (tu'u ma macro fa'aletonu le aofia)

E mafai ona faʻatulagaina e tusa ai ma manaʻoga o tagata faʻatau, fausaga eseese o le silicon, safaira, SiC faʻavae GaN epitaxial pepa.

Semicera Nofoaga faigaluega Semicera fale faigaluega 2 Meafaigaluega masini CNN faʻagaioiga, vailaʻau faʻamamaina, faʻapipiʻi CVD O la matou tautua


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