4″ Gallium Oxide Substrates

Fa'amatalaga Puupuu:

4″ Gallium Oxide Substrates- Tatala tulaga fou o le lelei ma le faʻatinoga i le eletise eletise ma masini UV faʻatasi ma Semicera's high-quality 4″ Gallium Oxide Substrates, ua mamanuina mo faʻaoga semiconductor pito sili ona lata mai.


Fa'amatalaga Oloa

Faailoga o oloa

Semicerafaailoa atu ma le mitamita lona4" Gallium Oxide Substrates, o se mea e suatia ai le eleele ua fa'ainisinia e fa'amalieina le fa'atupulaia o mana'oga o masini semiconductor fa'atino maualuga. Gallium Oxide (Ga2O3) substrates ofo atu se ultra-lautele bandgap, faia lelei mo le isi augatupulaga eletise eletise, UV optoelectronics, ma masini maualuga-telefoni.

 

Vaega Autu:

• Ultra-Wide Bandgap: O le4" Gallium Oxide Substratesfa'amaualuga se fusi fa'amau e tusa ma le 4.8 eV, fa'ataga mo le fa'amalieina o le voli ma le vevela, e matua'i fa'atusaina ai mea masani semiconductor pei o le silicon.

Maualuluga Malolo malepe: O mea nei e mafai ai e masini ona fa'agaoioi i le maualuga o voltage ma malosiaga, ma fa'aatoatoaina mo fa'aoga maualuga-voltage i le eletise eletise.

Maualuluga Mausali Fa'avevela: Gallium Oxide substrates e ofoina atu le lelei o le vevela, faʻamautinoa le faʻatinoina o galuega i lalo o tulaga ogaoga, lelei mo le faʻaogaina i siosiomaga faigata.

Tulaga Maualuga Maualuga: Faʻatasi ai ma le maualalo o le faʻaletonu ma le maualuga o le tioata, o nei mea e faʻamautinoa ai le faʻatuatuaina ma le faʻaauau pea, faʻaleleia le lelei ma le tumau o au masini.

Talosaga Fetuuna'i: E fetaui lelei mo le tele o faʻaoga, e aofia ai transistors eletise, Schottky diodes, ma UV-C LED masini, faʻamalosia faʻafouina i le mana ma le optoelectronic fanua.

 

Su'esu'e le lumana'i o tekonolosi semiconductor ma Semicera's4" Gallium Oxide Substrates. O a matou mea faʻapipiʻi ua mamanuina e lagolago ai faʻaoga sili ona maualuga, tuʻuina atu le faʻamaoni ma le lelei e manaʻomia mo masini faʻaonaponei i aso nei. Talitonu Semicera mo le lelei ma le faʻafouina i au mea semiconductor.

Aitema

Gaosiga

Suesuega

Faafoliga

Fa'a tioata

Polytype

4H

Fa'asagaga i luga ole mea sese

<11-20 >4±0.15°

Fa'aeletise Parata

Fa'amamafa

n-ituaiga Nitrogen

Tete'e

0.015-0.025ohm·cm

Fa'ailoga Fa'ainisinia

Diamita

150.0±0.2mm

mafiafia

350±25 μm

Primary flat orientation

[1-100]±5°

Muamua mafolafola umi

47.5±1.5mm

Lua mafolafola

Leai

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

punou

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

A'ai

≤35 μm

≤45 μm

≤55 μm

Luma(Si-foliga) talatala(AFM)

Ra≤0.2nm (5μm*5μm)

Fauga

Micropipe density

<1 ae/cm2

<10 ea/cm2

<15 ea/cm2

Uamea eleelea

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Tulaga Luma

Luma

Si

Fa'ai'uga luga

Si-foliga CMP

fasimea

≤60ea/wafer (tele≥0.3μm)

NA

Masisi

≤5ea/mm. Fa'aputuga umi ≤Diamita

Fa'aputuga umi≤2*Diamita

NA

Pa'u moli/lua/pisa/striations/ta'eta'e/fa'aleagaina

Leai

NA

Ta'otoga meataalo/indents/ gau/papa hex

Leai

Polytype vaega

Leai

Vaega fa'aopoopo≤20%

Vaega fa'aopoopo≤30%

Faailoga leisa pito i luma

Leai

Tulaga Tulaga

Fa'ai'u tua

C-foliga CMP

Masisi

≤5ea/mm, Fa'aputuga umi≤2* Diamita

NA

faaletonu i tua

Leai

Talatala tua

Ra≤0.2nm (5μm*5μm)

Faailoga leisa tua

1 mm (mai le pito i luga)

pito

pito

Chamfer

afifiina

afifiina

Epi-sauni ma fa'apipi'i gaogao

afifiina kaseti tele-wafer

*Faamatalaga: "NA" o lona uiga e leai se talosaga O mea e le o taʻua e mafai ona faasino ile SEMI-STD.

tech_1_2_size
SiC wafers

  • Muamua:
  • Sosoo ai: