SiC faʻapipiʻi faʻapipiʻi mo le semiconductor etching

Fa'amatalaga Puupuu:

Semicera Semiconductor Technology Co., Ltd. ose ta'ita'i fa'atau oloa gaosi semiconductor sili atu. O a matou oloa autu e aofia ai: Silicon carbide etched discs, silicon carbide boat trailers, silicon carbide wafer ships (PV & Semiconductor), silicon carbide furnace tubes, silicon carbide cantilever paddles, silicon carbide chuck, silicon carbide beams, faapea foi ma le CVD SiC coatings ma TaC coatings.

O oloa e masani ona faʻaaogaina i le semiconductor ma photovoltaic alamanuia, e pei o le tuputupu aʻe tioata, epitaxy, etching, afifiina, faʻapipiʻi ma faʻasalalauga masini ogaumu.

 

 


Fa'amatalaga Oloa

Faailoga o oloa

Fa'amatalaga

O la matou kamupani e tuʻuina atu auaunaga faʻapipiʻi SiC e ala i le auala CVD i luga o le graphite, ceramics ma isi mea, ina ia mafai ai e kasa faʻapitoa o loʻo i ai carbon ma silicon ona tali atu i le maualuga o le vevela e maua ai le mama maualuga SiC mole, molelaʻau teuina i luga o mea faʻapipiʻi, fa'atūina le SIC fa'apipi'i puipui.

Vaega Autu

1. maualuga le vevela oxidation tetee:
o loʻo lelei tele le faʻamaʻiina o le faʻamaʻi pe a maualuga le vevela ile 1600 C.
2. maualuga le mama: faia e vailaau ausa tuu i lalo o le maualuga vevela tulaga chlorination.
3. Erosion tete'e: maualuga ma'a'a, fa'apipi'i luga, vaega laiti.
4. Tete'e a'a: acid, alkali, masima ma organic reagents.

Fa'amatalaga autu o le CVD-SIC Coating

SiC-CVD Meatotino

Fauga tioata FCC β vaega
Malosi g/cm ³ 3.21
Malosi Vickers maaa 2500
Tele o Saito μm 2~10
Vailaau Mama % 99.99995
Malosiaga vevela J·kg-1 ·K-1 640
Sulimation Temperature 2700
Malosi Felexural MPa (RT 4-point) 415
Young's Modulus Gpa (4pt pi'o, 1300℃) 430
Fa'alauteleina o le vevela (CTE) 10-6K-1 4.5
Fa'avevela vevela (W/mK) 300
Semicera Nofoaga faigaluega
Semicera fale faigaluega 2
Meafaigaluega masini
CNN faʻagaioiga, vailaʻau faʻamamaina, faʻapipiʻi CVD
O la matou tautua

  • Muamua:
  • Sosoo ai: